Workshops

GEC 2025 Workshop Topics and Organizers - Monday, 13 October 2025



  1. Plasma Photonics, Metamaterials, Strongly Coupled Plasmas - Profs. Gerrit Kroesen (TU/e, Netherlands) and Mark Cappelli (Stanford University, USA)
    • Osamu Sakai, University of Shiga Prefecture, Japan, Plasma photonic crystals and metamaterials with functional output based on their spatial profiles
    • Sung-Jin Park, University of Illinois, Champaign-Urbana, TBD
    • Jesse Rodriguez, Oregon State University, USA, In-situ inverse design of plasma metamaterials
    • Min Sup Hur, Ulsan National Institute of Science and Technology (UNIST), S. Korea, New idea of plasma based pulse compression
    • Gun Su Yun, Pohang University of Science and Technology (POSTECH), S. Korea, Strongly coupled plasma and photonic crystal at high pressure plasmas
    • Thierry Callegari, University of Toulouse, France, TBD
  2. Space Plasma Physics and Technology - Profs. Wonho Choe (KAIST, Korea) and Stephane Mazouffre (CNRS, France)
    • Stephane Mazouffre, ICARE, CNRS, France, TBD
    • Kazunori Takahashi, Tohoku University, Japan, Magnetic nozzle rf plasma thruster: fundamental physics and current performance
    • Kil-Byoung Chai, Korea Atomic Energy Research Institute, Korea, Effect of applied magnetic fields on the performance and discharge characteristics of MPD thrusters
    • Zun Zhang, Beihang University, China, Several Issues Considered in Plasma Diagnostics
    • Mario Merino, Universidad Carlos III de Madrid, Spain, Kinetic and Electromagnetic simulation of Electrodeless Plasma Thrusters
    • Tommaso Andreussi, Sant'Anna School of Advanced Studies, Italy, TBD
  3. Industrial Applications of Plasma Technology to Microelectronics - Drs. Sangki Nam (Samsung Electronics, Korea) and Jung-Sik Yoon (KFE, Korea)
    • JongChul Park, Samsung, TBD
    • Yeonghun Han, SK Hynix, DRAM Memory High Aspect Ration Etch (HARC) Case Study, Opportunity, Challenges
    • Tat Loon Chng, Professor, National University of Singapore, TBD
    • Jin-Chul Son, PSK, Korea, Mild Surface Treatment Device for Semiconductor process
    • Jong-Sik Kim, Korea Institute of Fusion Energy, Plasma Equipment Intelligence research in KFE
    • Ki Chul Um, ASE Co., Ltd.,TBD
  4. Combining Plasma Modeling and Artificial Intelligence - Profs. Byungjo Kim (UNIST) and Ho Jun Kim (Hanyang University Erica, Korea)
    • Peter Ventzek, TEL America, Integrated modeling and simulation incorporating machine learning methods: case studies and perspectives on usefulness
    • Changho Hong, Seoul National University, Atomistic Simulation of reactive ion etching using machine learning interatomic potentials
    • Hyungseon Song, Quantemol, Quantitative Analysis of Mono-Energetic Ion Flux Control in Atomic Layer Etching via Tailored Waveform Profiles
    • Byungjo Kim, UNIST, Bridging Plasma Equipment and Surface Processes: Insights from Simulation and AI
    • Kisuk Sung, RTM, TBD
    • Rohini Mishra, Lam Research, PIC Simulation of ICP equipment using K-PIC code
    • Hae June Lee, Pusan National University, S. Korea, Enhancement of the simulation Speed of a PIC simulation combined with ML technology
    • Yuantao Zhang, Shandong University, China, TBD
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