The list of invited speakers (alphabetical) at the 2024 GEC in San Diego, California are as follows:
Aaron Knoll, Imperial College London, United Kingdom
Water electrolysis Hall thrusters
Abbas Semnani, University of Toledo, USA
Synergies of plasma-electromagnetic interaction in RF electronic applications
Ahmad Hamdan, Université de Montréal, Canada
Nanosecond discharge in air in contact with liquids at different electrical conductivity and dielectric permittivity
Alejandro Alvarez Laguna, Laboratoire de Physique des Plasmas, CNRS, Ecole Polytechnique, France
High-order moment closures for fluid models in weakly-ionized plasmas
Alexander Khrabry, Princeton University, USA
Analysis of chemical mechanisms in methane pyrolysis for carbon product generation
Alexander Perel, Applied Materials Inc., USA
Plasma density oscillations in an ion implanter source and their effect on ion beam transmission
Alok Ranjan, Applied Materials, Inc., USA
Emerging etch technologies to enable “more than Moore”
Ana Sobota, Eindhoven University of Technology, Netherlands
The interaction of atmospheric pressure plasmas with targets
Andrei Khomenko, Applied Materials Inc., USA
Advanced diagnostics in industrial plasma processing reactors
Andrei Smolyakov, University of Saskatchewan, Canada
On plasma acceleration in magnetic nozzle/mirror configurations
Andrew Tasman Powis, Princeton Plasma Physics Laboratory, USA
Algorithms and high-performance computing for kinetic low-temperature plasma simulations - the pathway to whole device modeling
Anthony Murphy, CSIRO Manufacturing, Australia
Hydrogen plasma processing of iron ore
Arthur Dogariu, Texas A&M and Princeton Universities, USA
Ultrafast advanced optical diagnostics for large-scale facilities
Carmen Guerra-Garcia, Massachusetts Institute of Technology, USA
Discharges in reactive and flowing gases
David B. Go, University of Notre Dame, USA
Piezoelectric Crystals for Plasma Discharge Generation
David Fried, Lam Research, USA
Chips making chips: The role of reactor-scale modeling and virtualization in advanced semiconductor development
Dmitry Fursa, Curtin University, Australia
Electron and positron collision calculations
Eray Aydil, New York University, USA
The potential roles for plasmas in the electrification and decarbonization of chemical manufacturing
Fabien Tholin, ONERA, France
MHD modeling of lightning arcs, electrical explosions, and plasma discharges
Ilya Fabrikant, University of Nebraska - Lincoln, USA
Laser-assisted positron and positronium collisions
Ioan F. Schneider, Université Le Havre Normandie, France
Electron-induced reactivity of molecular cations in low-temperature plasmas and astrochemistry
James Babb, Center for Astrophysics | Harvard & Smithsonian, USA
Low energy atomic and ionic collisions
Jean-Pierre Boeuf, Universite de Toulouse III, France
Striations in a positive column plasma. Role of transport coefficients and stepwise ionization
JongChul Park, Samsung Electronics, S. Korea
Next-generation etching technologies for semiconductor mass-production
Judith Golda, Ruhr University Bochum, Germany
Plasma-surface interaction in plasma catalysis
Karoly Tokesi, Hungarian Academy of Sciences, Hungary
Ionization, total and state selective charge exchange cross sections in fusion related collision systems
Kazunori Koga, Kyushu University, Japan
Study on plasma-driven omics variation on plant seeds
Lenka Zajíčková, CEITEC and Masaryk University, Czech Republic
Role of plasma polymerization conditions in forming unsaturated and aromatic bonds and free radicals
Li Wang, Ruhr-University Bochum, Germany
Uniformity control in low pressure capacitive RF plasmas by electrode customization
Mario Merino, University of Madrid, Spain
PIC and fluid simulations of low-pressure magnetized plasmas for electric propulsion
Mark A. Cappelli, Stanford University, USA
Plasma electromagnetics: from optical computing to the study of topological interface states
Mark Koepke, West Virginia University, USA
The role of periodic nonlinear phenomena on low-temperature plasma science
Naoki Shirai, Hokkaido University, Japan
Atmospheric-pressure DC exited discharge with liquid anode and cathode
Pedro Viegas, Instituto Superior Técnico - Universidade de Lisboa, Portugal
Surface recombination in oxygen-containing plasmas
Pingshan Luan, TEL Technology Center America, USA
Opportunities and challenges of plasma modeling in supporting industrial etch development
Mohan Sankaran, University of Illinois Urbana-Champaign, USA
Plasma electrochemistry for organic synthesis
Sanghoo Park, Korea Advanced Institute of Science and Technology, S. Korea
Understanding nitrous and nitric acids formation in plasma-treated water for food applications
Sang Ki Nam, Samsung Electronics, S. Korea
Combining two modeling paradigms for semiconductor processing
Shota Sasaki, Tohoku University, Japan
Controlled generation of reactive nitrogen species using air plasmas and its agricultural applications
Sierra Jubin, Princeton University, Princeton Plasma Physics Laboratory, USA
Numerical Thermalization Timescales in Electrostatic Particle-in-Cell Simulations
Sophia Gershman, Princeton Plasma Physics Laboratory, USA
Environmental applications of non-equilibrium plasma sources
Svetlana Starikovskaya, Laboratory for Plasma Physics, CNRS, Ecole Polytechnique, France
Dissociation of CO2 by nanosecond discharge: TALIF - measurements of O-atoms density and fast gas heating
Tat Loon Chng, National University of Singapore
Electric field measurements using the E-FISH diagnostic for non-equilibrium plasmas
Thierry Magin, Université Libre de Bruxelles, Belgium
Plasma-surface interactions in hypersonic and atmospheric entry flows
Thorsten Lill, Lam Research, USA
Physical and chemical effects in low temperature etching of semiconductor materials
Tiago C. Dias, Instituto Superior Técnico, Universidade de Lisboa, Portugal
Unified Monte Carlo formulation of nanosecond discharges
Tiago Silva, Instituto Superior Técnico, Universidad de Lisboa, Portugal
Plasmas for CO2 conversion on Mars
Toshiro Kaneko, Tohoku University, Japan
Spatio-temporal dynamics of plasmas in contact with low-dimensional interfacial liquids
Uwe Czarnetzki, Ruhr-University Bochum, Germany
Inductively coupled array (INCA) discharge
Vandana Miller, Drexel University, USA
Feedback between plasma source and biological tissue
Victor Desangles, ONERA, Université Paris-Saclay, France
ECR thrusters and magnetic nozzles
XinPei Lu, HuaZhong University of Science and Technology, China
Plasma for nitrogen fixation: comprehensive diagnosis of plasma parameters and reaction pathway
Yasunori Tanaka, Kanazawa University, Japan
Higher-Order Spatio-Temporal Control of Induction Thermal Plasma Flow
Yue-Ying Lau, University of Michigan, USA
Recent advances in the Child-Langmuir law in one, two, and three dimensions
Yuki Inada, Saitama University, Japan
Electron density and electric field measurement of space-time-controlled single-filament streamer discharge in atmospheric-pressure air
Zoltan Donko, Wigner Research Centre for Physics, Hungary
Self-consistent computation of the optical emission spectrum of low-pressure argon capacitively coupled plasmas
Zsolt Mezei, HUN-REN Institute for Nuclear Research, Hungary
Electron-driven reactivity of molecular cations in cold plasmas
